Our power supplies are designed for the everyday use in the industrial production everywhere where vacuum plasma is implicated.

We deliver different power supplies which are optimized according to your application:

• Sputtering processes
• BIAS applications
• Arc cathode supply
• Dual Magnetron applications
• Impulse Magnetron applications

A wide range of different performance classes permits the optimum for each application between 1 kW up to 60 kW and/or 240 kW. All devices can operate parallel and can so increase the power or show redundancy.

Devices in the middle and high capacity range have an outstanding power density (achievement/equipment volume) and are thus enormously efficent. Small size and small weight offer advantages without compromises with the reliability. High efficiency during the transformation reduces the waste heat production, whereby the requirements can be kept low by the cooling systems. All devices are air-cooled, whereby maintenance costs can be kept small. Optionally devices of the middle and high performance class can be ordered also water-cooled.