Highly efficient linear ion sources for etching and cleaning, adhesion enhancement and DLC deposition.

The following ion source product options available:

PPALS™ (Pointed Pole Anode Layer Ion Source)  

The PPALS™ ion source is an ideal source for installations in which etch rate and low contamination play important roles in process performance. The patented pointed pole design optimizes the electron optics in the racetrack resulting in a >2X improvement in etch rate over existing technologies. The same feature also virtually eliminates contamination by pole sputtering.

High dynamic etch rate (30 nm m/min) 10x reduction in contamination Easy retrofit for existing anode layer ion sources from all manufacturers 3+ meters long

Typical Applications:

• Adhesion promotion on polymer substrates prior to deposition
• Removal of surface contaminates
• Etching of surface coatings or bulk substrate
• Surface Functionalization

Classic Linear Ion Source (LIS)

New product line! Available from 380mm to 3700 mm Versatile - Cleaning, etching, surface modification, ion beam assisted deposition Flange and remote mounts available